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A Comprehensive Approach Towards Optimizing the Xenon Plasma Focused Ion Beam Instrument for Semiconductor Failure Analysis Applications
Subramaniam, Srinivas, Huening, Jennifer, Richards, John, Johnson, KevinLangue:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/S1431927617000563
Date:
June, 2017
Fichier:
PDF, 1.49 MB
english, 2017