SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies
Chiou, Tsann-Bim, Chen, Alek C., Lin, Burn, Socha, Robert, Kang, Ho-Young, Yen, Anthony, Chen, Alek C., Hsu, Stephen, Chen, Hong, Chen, LuoqiVolume:
7140
Année:
2008
Langue:
english
DOI:
10.1117/12.804763
Fichier:
PDF, 443 KB
english, 2008