SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - DSA patterning options for logics and memory applications
Hohle, Christoph K., Gronheid, Roel, Liu, Chi-Chun, Franke, Elliott, Mignot, Yann, LeFevre, Scott, Sieg, Stuart, Chi, Cheng, Meli, Luciana, Parnell, Doni, Schmidt, Kristin, Sanchez, Martha, Singh, LovVolume:
10146
Année:
2017
Langue:
english
DOI:
10.1117/12.2260479
Fichier:
PDF, 5.35 MB
english, 2017
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