Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
Buttera, Sydney C., Mandia, David J., Barry, Seán T.Volume:
35
Langue:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4972469
Date:
January, 2017
Fichier:
PDF, 632 KB
english, 2017