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Interface trap density evaluation on bare silicon-on-insulator wafers using the quasi-static capacitance technique
Pirro, L., Ionica, I., Ghibaudo, G., Mescot, X., Faraone, L., Cristoloveanu, S.Volume:
119
Langue:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4947498
Date:
May, 2016
Fichier:
PDF, 1.40 MB
english, 2016