[IEEE 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Sendai, Japan (2016.8.22-2016.8.25)] 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO) - Statistical device simulation of characteristic fluctuation of 10-nm gate-all-around silicon nanowire MOSFETs induced by various discrete random dopants
Sung, Wen-Li, Chang, Han-Tung, Chen, Chieh-Yang, Chao, Pei-Jung, Li, YimingAnnée:
2016
Langue:
english
DOI:
10.1109/nano.2016.7751556
Fichier:
PDF, 1.27 MB
english, 2016