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Electrical and Structural Properties of Metal-Oxide-Semiconductor (MOS) Devices with Pt/Ta2O5 Gate Stacks
LEE, Hoon-Ki, CHANDRA, S.V. Jagadeesh, SHIM, Kyu-Hwan, YOON, Jong-Won, CHOI, Chel-JongVolume:
E94-C
Année:
2011
Langue:
english
Journal:
IEICE Transactions on Electronics
DOI:
10.1587/transele.e94.c.846
Fichier:
PDF, 1.02 MB
english, 2011