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Comprehensive effects of strained Ge1−xSnx and device layout arrangement on a nano-scale Ge-based PMOSFET with a short channel
Lee, Chang-Chun, Huang, Pei-ChenLangue:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.10.020
Date:
October, 2016
Fichier:
PDF, 1.16 MB
english, 2016