Numerical Analysis of Thermo Resist Enhanced Optical Lithography.
Amaya, Kenji, Akagawa, Etsutaro, Gelbart, Dan, Karasyuk, ValentinVolume:
13
Année:
2000
Langue:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.13.441
Fichier:
PDF, 370 KB
english, 2000