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[IEEE 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) - San Jose, CA, USA (2016.5.23-2016.5.26)] 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) - The Cu exposure effect in AIO etch at advanced CMOS technologies
Junqing Zhou,, Qiyang He,, Minda Hu,, Kefang Yuan,, Yibin Cao,, Linlin Sun,, Xinghua Song,, Haiyang Zhang,Année:
2016
Langue:
english
DOI:
10.1109/IITC-AMC.2016.7507713
Fichier:
PDF, 743 KB
english, 2016