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Impact of post-metal deposition annealing temperature on performance and reliability of high-K metal-gate n-FinFETs
Lin, Chien-Yu, Chang, Ting-Chang, Liu, Kuan-Ju, Tsai, Jyun-Yu, Chen, Ching-En, Liu, Hsi-Wen, Lu, Ying-Hsin, Tseng, Tseung-Yuen, Cheng, Osbert, Huang, Cheng-TungLangue:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2016.08.072
Date:
September, 2016
Fichier:
PDF, 1.27 MB
english, 2016