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Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection
Ha, Daegeun, Park, Damdae, Koo, Junmo, Baek, Kye Hyun, Han, ChonghunVolume:
94
Langue:
english
Journal:
Computers & Chemical Engineering
DOI:
10.1016/j.compchemeng.2016.08.012
Date:
November, 2016
Fichier:
PDF, 2.65 MB
english, 2016