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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Defects caused by blank masks and repair solution with nanomachining for 20nm node
Ackmann, Paul W., Hayashi, Naoya, Lee, HyeMi, Kim, ByungJu, Kim, MunSik, Jung, HoYong, Kim, Sang Pyo, Yim, DongGyuVolume:
9235
Année:
2014
Langue:
english
DOI:
10.1117/12.2066278
Fichier:
PDF, 473 KB
english, 2014