Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles
Shaw, Santosh, Miller, Kyle J., Colaux, Julien L., Cademartiri, LudovicoVolume:
15
Langue:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.jmm.15.3.031607
Date:
September, 2016
Fichier:
PDF, 1.71 MB
english, 2016