
Surface Morphology Transformation Under High-Temperature Annealing of Ge Layers Deposited on Si(100)
Shklyaev, A. A., Latyshev, A. V.Volume:
11
Langue:
english
Journal:
Nanoscale Research Letters
DOI:
10.1186/s11671-016-1588-1
Date:
December, 2016
Fichier:
PDF, 2.86 MB
english, 2016