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Verification of Fowler–Nordheim electron tunneling mechanism in Ni/SiO2/n-4H SiC and n+ poly-Si/SiO2/n-4H SiC MOS devices by different models
Kodigala, Subba RamaiahVolume:
500
Langue:
english
Journal:
Physica B: Condensed Matter
DOI:
10.1016/j.physb.2016.07.013
Date:
November, 2016
Fichier:
PDF, 1.34 MB
english, 2016