SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Integrated Circuit Metrology, Inspection, and Process Control II - A New Reticle Set For Electrical Measurement Of Resolution, Proximity, Topography, Sidewall Spacer, And Stacked-Gate Structures
Stevenson, W. L., Monahan, Kevin M.Volume:
921
Année:
1988
Langue:
english
DOI:
10.1117/12.968363
Fichier:
PDF, 14.05 MB
english, 1988