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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Multilayer coating requirements for extreme ultraviolet lithography masks
Hector, Scott D., Gullikson, Eric M., Mirkarimi, Paul B., Spiller, Eberhard A., Kearney, Patrick A., Folta, James A., Dao, Giang T., Grenon, Brian J.Volume:
4562
Année:
2002
Langue:
english
DOI:
10.1117/12.458369
Fichier:
PDF, 332 KB
english, 2002