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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Consideration for application of NTD from OPC and simulation perspective
Kim, Mihye, Moon, James, Nam, Byoung-sub, Oh, Se-young, Yang, Hyun-jo, Yim, Donggyu, Conley, WillVolume:
8326
Année:
2012
Langue:
english
DOI:
10.1117/12.916137
Fichier:
PDF, 1.03 MB
english, 2012