SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - In-process defect inspection and characterization study for dry etching chrome-on-quartz binary masks
Cai, Weidong, Grenon, Brian J., Dao, Giang T., Kamberian, Henry H., Mattis, Douglas G., Morris, Kraig, Tu, VanVolume:
4186
Année:
2000
Langue:
english
DOI:
10.1117/12.410692
Fichier:
PDF, 900 KB
english, 2000