SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - New electron-beam mask writing system for 0.25-um lithography
Satoh, Hidetoshi, Someda, Yasuhiro, Saitou, Norio, Kawasaki, Katsuhiro, Itoh, Hiroyuki, Mizuno, Kazui, Seeger, David E.Volume:
2723
Année:
1996
Langue:
english
DOI:
10.1117/12.240460
Fichier:
PDF, 319 KB
english, 1996