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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Thick film photoresist resolution enhancement with surfactant surface treatment
McKean, Dennis R., Russell, Thomas P., Renaldo, Alfred F., Allen, Robert D.Volume:
2438
Année:
1995
Langue:
english
DOI:
10.1117/12.210365
Fichier:
PDF, 654 KB
english, 1995