SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
Lee, Hojune, Kimmel, Kurt R., Staud, Wolfgang, Yang, Seung-Hune, Park, Jin-Hong, Moon, Seong-Yong, Choi, Seong-Woon, Sohn, Jung-MinVolume:
5256
Année:
2003
Langue:
english
DOI:
10.1117/12.518283
Fichier:
PDF, 91 KB
english, 2003