SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - OPC verification and hotspot management for yield enhancement through layout analysis
Raymond, Christopher J., Yoo, Gyun, Kim, Jungchan, Lee, Taehyeong, Jung, Areum, Yang, Hyunjo, Yim, Donggyu, Park, Sungki, Maruyama, Kotaro, Yamamoto, Masahiro, Vikram, Abhishek, Park, SanghoVolume:
7971
Année:
2011
Langue:
english
DOI:
10.1117/12.870395
Fichier:
PDF, 1.06 MB
english, 2011
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