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SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Wafer based mask characterization for double patterning lithography
de Kruif, Robert, Bubke, Karsten, Janssen, Gert-Jan, van der Heijden, Eddy, Fochler, Jörg, Dusa, Mircea, Peters, Jan Hendrik, de Haas, Paul, Connolly, BridVolume:
6792
Année:
2008
Langue:
english
DOI:
10.1117/12.798515
Fichier:
PDF, 887 KB
english, 2008