SPIE Proceedings [SPIE Optics & Photonics 2005 - San Diego, California, USA (Sunday 31 July 2005)] Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II - Characterization of extreme ultraviolet (EUV) emission from xenon generated using a compact plasma-discharge source for lithography applications
Merabet, H., Kyrala, George A., Gauthier, Jean-Claude J., Bista, R., Schubert, C., MacDonald, Carolyn A., Khounsary, Ali M., Fuelling, S., Bruch, R., Godunov, A. L.Volume:
5918
Année:
2005
Langue:
english
DOI:
10.1117/12.613983
Fichier:
PDF, 289 KB
english, 2005