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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Polyvinylphenols protected with tetrahydropyranyl group in chemical amplification positive deep-UV resist systems
Hayashi, Nobuaki, Schlegel, Leo, Ueno, Takumi, Shiraishi, Hiroshi, Iwayanagi, Takao, Ito, HiroshiVolume:
1466
Année:
1991
Langue:
english
DOI:
10.1117/12.46386
Fichier:
PDF, 282 KB
english, 1991