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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - OPC strategies to minimize mask cost and writing time
Rieger, Michael L., Mayhew, Jeffrey P., Li, Jiangwei, Shiely, James P., Dao, Giang T., Grenon, Brian J.Volume:
4562
Année:
2002
Langue:
english
DOI:
10.1117/12.458287
Fichier:
PDF, 94 KB
english, 2002