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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Optimum field-size strategy for DRAM mass production in low-k1 process
Park, Chan-Ha, Yim, Donggyu, Lee, Seung-Hyuk, Yang, Hyun-Jo, Choi, Jae-Hak, Shin, Yong-Chul, Kim, Choi-Dong, Choi, Jae-Sung, Kang, Khil-Ohk, Kim, Sang-Wook, Lee, Dong-Duk, Yoon, Gyu-Han, Progler, ChriVolume:
4346
Année:
2001
Langue:
english
DOI:
10.1117/12.435634
Fichier:
PDF, 667 KB
english, 2001