SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Crystal growth printability in an advanced foundry FAB: a correlation study between STARlight and ultra broadband BrightField inspection technologies
Ng, Teng Hwee, Kawahira, Hiroichi, Zurbrick, Larry S., bin Rahmat, Mohammed Fahmy, Saville, Barry, Pak, Patrick, Chia, WeeTeck, Chin, Aaron, VanRiet, Mike, Dover, Russell, Badoni, RajVolume:
7122
Année:
2008
Langue:
english
DOI:
10.1117/12.801868
Fichier:
PDF, 233 KB
english, 2008