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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Study on nano imprint lithography by the pre-exposure process (PEP)
Kono, Yoshiyuki, Sturtevant, John L., Sekiguchi, Atsushi, Hirai, Yoshihiko, Arasaki, Shigeo, Hattori, KoichiVolume:
5753
Année:
2005
Langue:
english
DOI:
10.1117/12.598607
Fichier:
PDF, 276 KB
english, 2005