SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Intel benchmarking and process integration of 157-nm resists
Powers, James M., Roberts, Jeanette M., Zimmerman, Paul A., Meagley, Robert P., Putna, E. Steve, Shah, Uday, Fedynyshyn, Theodore H.Volume:
5039
Année:
2003
Langue:
english
DOI:
10.1117/12.483730
Fichier:
PDF, 397 KB
english, 2003