SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Feasibility study of non-topcoat resist for 22nm node devices
Sho, Koutaro, Henderson, Clifford L., Kato, Hirokazu, Kobayashi, Katsutoshi, Iida, Kazunori, Ori, Tomoya, Muto, Daizo, Azuma, Tsukasa, Ito, Shinichi, Fujiwara, Tomoharu, Ishii, Yuuki, Nishimura, YukioVolume:
7273
Année:
2009
Langue:
english
DOI:
10.1117/12.812475
Fichier:
PDF, 170 KB
english, 2009