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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Track oriented chemically-amplified resist processes for quarter-micron lithography
Reilly, Michael T., Krasnoperova, Azalia A., Leonard, Quinn J., Taylor, James W., Pan, Shaowie, Hinsberg, William D.Volume:
1925
Année:
1993
Langue:
english
DOI:
10.1117/12.154768
Fichier:
PDF, 218 KB
english, 1993