SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL
Jang, Il-Yong, Kawahira, Hiroichi, Zurbrick, Larry S., Huh, Sung-Min, Moon, Seong-Yong, Woo, Sang-Gyun, Lee, Jin-Kwan, Moon, Sang Heup, Cho, HanKuVolume:
7122
Année:
2008
Langue:
english
DOI:
10.1117/12.801413
Fichier:
PDF, 1.12 MB
english, 2008