SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Comparison of dry-etch approaches for tungsten patterning
Dobisz, Elizabeth A., Eddy, Jr., Charles R., Kosakowski, John, Glembocki, Orest J., Shirey, Loretta M., Foster, Kelly W., Chu, William P., Rhee, Kee W., Park, D. W., Marrian, Christie R., Peckerar, MaVolume:
2194
Année:
1994
Langue:
english
DOI:
10.1117/12.175803
Fichier:
PDF, 711 KB
english, 1994
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