SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Double patterning for 32nm and below: an update
Finders, Jo, Dusa, Mircea, Vleeming, Bert, Megens, Henry, Hepp, Birgitt, Maenhoudt, Mireille, Cheng, Shaunee, Vandeweyer, TomVolume:
6924
Année:
2008
Langue:
english
DOI:
10.1117/12.772780
Fichier:
PDF, 676 KB
english, 2008
File converter
Plus de résultats de recherche
More benefits 
