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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Classification and recognition of diffraction structures using support vector machine in optical scatterometry
Zhu, Jinlong, Liu, Shiyuan, Zhang, Chuanwei, Chen, Xiuguo, Dong, Zhengqiong, Starikov, AlexanderVolume:
8324
Année:
2012
Langue:
english
DOI:
10.1117/12.916259
Fichier:
PDF, 637 KB
english, 2012