SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography
Yamashita, T., Sturtevant, John L., Ishikawa, T., Yoshida, T., Hayamai, T., Araki, Takayuki, Aoyama, H., Hagiwara, T., Itani, Toshiro, Fujii, KiyoshiVolume:
5753
Année:
2005
Langue:
english
DOI:
10.1117/12.599523
Fichier:
PDF, 217 KB
english, 2005