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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Comparison of directed self-assembly integrations
Somervell, Mark, Gronheid, Roel, Hooge, Joshua, Nafus, Kathleen, Rincon Delgadillo, Paulina, Thode, Chris, Younkin, Todd, Matsunaga, Koichi, Rathsack, Ben, Scheer, Steven, Nealey, Paul, Somervell, MarVolume:
8325
Année:
2012
Langue:
english
DOI:
10.1117/12.916406
Fichier:
PDF, 2.17 MB
english, 2012