SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - 65-nm full-chip implementation using double dipole lithography
Hsu, Stephen D., Chen, J. Fung, Cororan, Noel, Knose, William T., Van Den Broeke, Douglas J., Laidig, Thomas L., Wampler, Kurt E., Shi, Xuelong, Hsu, Michael, Eurlings, Mark, Finders, Jo, Chiou, TsannVolume:
5040
Année:
2003
Langue:
english
DOI:
10.1117/12.485445
Fichier:
PDF, 1.41 MB
english, 2003
File converter
Plus de résultats de recherche
More benefits 
