SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Laser spectrum requirements for tight CD control at advanced logic technology nodes
Peng, R. C., Dusa, Mircea V., Conley, Will, Lee, H. J., Lin, John, Lin, Arthur, Chang, Allen, Lin, Benjamin Szu-MinVolume:
7640
Année:
2010
Langue:
english
DOI:
10.1117/12.846516
Fichier:
PDF, 411 KB
english, 2010