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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - A novel full chip process window OPC based on matrix retargeting
Erdmann, Andreas, Kye, Jongwook, Zhang, Xima, Yu, Zhitang, Liu, Qingwei, Shen, Xuan, Zhang, Liguo, Hong, Le, Liubich, Vlad, Lippincott, George, Zhu, Cynthia, Word, JamesVolume:
9780
Année:
2016
Langue:
english
DOI:
10.1117/12.2219913
Fichier:
PDF, 465 KB
english, 2016