SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - 11nm logic lithography with OPC-lite
Lai, Kafai, Erdmann, Andreas, Smayling, Michael C., Tsujita, Koichiro, Yaegashi, Hidetami, Axelrad, Valery, Nakayama, Ryo, Oyama, Kenichi, Hara, ArisaVolume:
9052
Année:
2014
Langue:
english
DOI:
10.1117/12.2045667
Fichier:
PDF, 3.69 MB
english, 2014