SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Gaps analysis for CD metrology beyond the 22nm node
Bunday, Benjamin, Germer, Thomas A., Vartanian, Victor, Cordes, Aaron, Cepler, Aron, Settens, Charles, Starikov, Alexander, Cain, Jason P.Volume:
8681
Année:
2013
Langue:
english
DOI:
10.1117/12.2012472
Fichier:
PDF, 2.88 MB
english, 2013