SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Impact of illumination on model-based SRAF placement for contact patterning
Sturtevant, John L., Dusa, Mircea V., Conley, Will, Jayaram, Srividya, El-Sewefy, Omar, Dave, Aasutosh, LaCour, PatVolume:
7640
Année:
2010
Langue:
english
DOI:
10.1117/12.846620
Fichier:
PDF, 1.61 MB
english, 2010