SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Overcoming pattern collapse on e-beam and EUV lithography
Jouve, A., Lin, Qinghuang, Simon, J., Pikon, A., Solak, H., Vannuffel, C., Tortai, J.-H.Volume:
6153
Année:
2006
Langue:
english
DOI:
10.1117/12.656400
Fichier:
PDF, 516 KB
english, 2006
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