SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Manufacturing considerations for implementation of scatterometry for process monitoring
Allgair, John A., Benoit, David C., Hershey, Robert R., Litt, Lloyd C., Abdulhalim, Ibrahim S., Braymer, William, Faeyrman, Michael, Robinson, John C., Whitney, Umar K., Xu, Yiping, Zalicki, Piotr, SeVolume:
3998
Année:
2000
Langue:
english
DOI:
10.1117/12.386465
Fichier:
PDF, 1.43 MB
english, 2000
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