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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - New electron optics for mask writer EBM-7000 to challenge hp 32nm generation
Kamikubo, Takashi, Kawahira, Hiroichi, Zurbrick, Larry S., Golladay, Steven, Kendall, Rodney, Katsap, Victor, Ohtoshi, Kenji, Ogasawara, Munehiro, Nishimura, Shinsuke, Nishimura, Rieko, Iizuka, Osamu,Volume:
7122
Année:
2008
Langue:
english
DOI:
10.1117/12.801725
Fichier:
PDF, 419 KB
english, 2008