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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Inverse lithography (ILT) mask manufacturability for full-chip device
Kim, Byung-Gook, Zurbrick, Larry S., Montgomery, M. Warren, Suh, Sung Soo, Woo, Sang Gyun, Cho, HanKu, Xiao, Guangming, Son, Dong Hwan, Irby, Dave, Kim, David, Baik, Ki-HoVolume:
7488
Année:
2009
Langue:
english
DOI:
10.1117/12.833572
Fichier:
PDF, 3.14 MB
english, 2009